Air Pollution Control and Emissions Standards for the Semiconductor Industry Article 5
For exhaust gases collected in accordance with the preceding article, flowmeters and concentration monitors shall be installed at the exhaust gas inlet of the pollution prevention and control equipment or at the discharge outlet of the discharge pipe. The installation shall meet the following requirements:1. Flowmeters shall be installed for the Semiconductor manufacturing industry governed by these Standards.2. In the event that the annual consumption of volatile organic compounds (VOC) is more than 25 tons or the total plant discharge volume is more than 0.6 kg per hour, it shall be deemed as a pipeline with VOCs discharge greater than 14 ppm under an existing established process or with VOCs discharge greater than 10 ppm under a newly established process, a VOCs concentration monitor shallbe installed to prove its compliance with the discharge reduction rate hereunder. Where an existing process and a newly established process are combined to set up a discharge pipeline, the newly established process shall prevail.3. The effective quarterly monitoring rate of the flow meters and concentration monitors shall exceed 80%. Comparative testing shall be performed using standard testing methods at least once each year; the comparative testing shall last for at least two hours on each occasion, and results obtained from the flowmeters and concentration monitors shall be corrected on the basis of the most recent comparative testing results.When the flow meters and concentration monitors have not been installed as prescribed in the foregoing paragraph, the public or private premises may submit an alternative solution that can prove that the discharge of the pollutants complies with the discharge standard set forth in the preceding article to the competent authority of the municipality or county (city) for approval. Upon this approval, the restriction will not apply.
中文原文 半導體製造業空氣污染管制及排放標準第5條
依前條規定收集之廢氣,於污染防制設備之廢氣導入處或排放管道排放口應設置流量計及濃度監測器,其設置規定如下:
一、適用本標準之半導體製造業均應設置流量計。
二、揮發性有機物原(物)料年用量大於二十五噸或工廠總排放量大於每小時零點六公斤者,屬既存製程其揮發性有機物排放大於十四ppm或屬新設製程其揮發性有機物排放大於十ppm之排放管道,應設置揮發性有機物濃度監測器證明符合本標準排放削減率。
既存製程與新設製程合併設置排放管道者,以新設製程之設置規定認定之。
三、流量計及濃度監測器之有效每季監測率應大於八十%,每年至少以標準檢測方法比測一次,比測時間每次至少二小時,所設置之流量計及濃度監測器所得之結果應以上次比測結果修正之。
未能依前項規定設置流量計及濃度監測器之排放管道,公私場所得提出其他可證明其排放污染物符合前條排放標準規定之替代方案,報請直轄市、縣(市)主管機關同意後,不在此限。
一、適用本標準之半導體製造業均應設置流量計。
二、揮發性有機物原(物)料年用量大於二十五噸或工廠總排放量大於每小時零點六公斤者,屬既存製程其揮發性有機物排放大於十四ppm或屬新設製程其揮發性有機物排放大於十ppm之排放管道,應設置揮發性有機物濃度監測器證明符合本標準排放削減率。
既存製程與新設製程合併設置排放管道者,以新設製程之設置規定認定之。
三、流量計及濃度監測器之有效每季監測率應大於八十%,每年至少以標準檢測方法比測一次,比測時間每次至少二小時,所設置之流量計及濃度監測器所得之結果應以上次比測結果修正之。
未能依前項規定設置流量計及濃度監測器之排放管道,公私場所得提出其他可證明其排放污染物符合前條排放標準規定之替代方案,報請直轄市、縣(市)主管機關同意後,不在此限。