Air Pollution Control and Emissions Standards for the Semiconductor Industry Article 4
Air pollutants generated by the Semiconductor manufacturing industry shall be gathered by a closed gas gathering system. They may not be discharged until provisions set forth in the following table are observed:In the event that the foregoing exhaust gases discharged, including nitric acid, hydrochloric acid, phosphoric acid, hydrofluoric acid, sulfuric acid, etc., cannot be proved to meet the standard under the preceding paragraph due to safety concerns, relevant documentary evidence shall be submitted to the competent authority of the municipality or county (city) to prove the control conditions with the equivalent or better treatment effect:Article 4.pdf
中文原文 半導體製造業空氣污染管制及排放標準第4條
（因條文排版無法完整呈現內容，請詳閱完整條文檔案）半導體製造業產生之空氣污染物應經密閉集氣系統收集，並應符合下表規定後始得排放：前項硝酸、鹽酸、磷酸、氫氟酸及硫酸等排放之廢氣，因安全之虞而無法證明符合前項標準時，應檢具相關證明文件佐證具備同等處理效果或較優之控制條件，向直轄市、縣（市）主管機關申請替代認可。