Air Pollution Control and Emissions Standards for the Semiconductor Industry Article 7

Should an existing process fail to meet the discharge standard set forth in Article 4 or the installation provision set forth in Article 5, the public or private premises shall, within six months following the implementation of this Amendment, submit an air pollution rectification plan to the competent authority of the municipality or county (city) for the approval of a rectification period, and complete the rectification to meet the requirements hereunder prior to the expiration of such period.The foregoing air pollution rectification plan shall include at least the type, structure, efficiency, processes, design diagrams, installation cost and progress of the rectification for raw materials (supplies), facilities or prevention and control equipment of the process, and the rectification period shall not exceed 18 months.Should the rectification fail to be completed within the rectification period approved under Paragraph 1, the public or private premises may, within one to three months prior to the expiration of the rectification period, submit an extension statement, plan and change to the rectification plan to the competent authority of the municipality or county (city) for approval to extend the rectification period. The extended rectification period shall not exceed 12 months, unless the extension is otherwise approved by the competent authority of the municipality or county (city).
中文原文 半導體製造業空氣污染管制及排放標準第7條
既存製程未能符合第四條排放標準或第五條設置規定者,公私場所應於本標準修正施行後六個月內,檢具空氣污染改善計畫,向直轄市、縣(市)主管機關申請核定改善期限,並應於期限屆滿前完成改善至符合本標準之規定。
前項空氣污染改善計畫至少應包含製程原(物)料、設施或防制設備改善種類、構造、效能、流程、設計圖說、設置經費及進度,且其改善期限不得逾十八個月。
未能於第一項核定改善期限內完成改善者,公私場所得於期限屆滿前一至三個月內,檢具展延說明、規劃及變更改善計畫,向直轄市、縣(市)主管機關申請核准展延改善期限,展延之改善期限不得逾十二個月。
但展延改善經直轄市、縣(市)主管機關另予核准改善期限者,不在此限。

English translation for reference only; the Chinese text prevails. Not legal advice.